AEV-11
was designed to deposit a mono-layer or thin films of metal or a semiconductor.
A wire type or a stick type sample may be heated with electron beam, and high
purity evaporation may be performed.
The maximum temperature is high enough to evaporate Fe, Co, Bi, Pt, Ag, Mo, Ta, W, etc. It is capable of using crucibles, and the user may use Ta and Mo as an option.
AEV-11 incorporates an internal flux monitor. The way it works is similar to that of an ion gauge. It monitors the evaporation speed by measuring the ion current from the ionized molecules which have been evaporated
and crushed into the electrons. It can control and stabilize
the deposition-area size. The user can easily replace the samples
of the AEV-11 through the φ34 ICF flange without removing the evaporator
from the chamber every time for a sample exchange.
AEV-11
was designed to deposit a mono-layer or thin films of metal or a semiconductor.
A wire type or a stick type sample may be heated with electron beam, and high
purity evaporation may be performed.